Advanced development platform specifically geared for printing electronics onto complex 3D surfaces. Ideally suited for process development, rapid prototyping.
Feature Sizes: millimeter to 10 um
Ink viscosity: 1 to 1000 cP
Deposition onto 3D Substrates
In-Situ Laser Sintering
Low Temperature Processing
Current Project Application: Special composite ink printing, Printed circuits on Soft Materials and Flexible Hybrid Integration
Details Under Construction
Under Construction
Under Construction
• Advanced prob system that enables electrical characterization for wafer from 50 mm to 300 mm.
• PC-controllable prob system with manual, semi-automatic, and fully automatic operation.
• Wide-range temperature measurement: -50OC to 300OC
Wavelength :375-2800nm
Output power :100mw
Fiber :400um, 1m, SMA connector
Fiber collimator: 1mm @5~10cm distance
Current project application:
two-dimensional materials-based optical devices
· Auto-alignment
· O-band, C-band
Current project application:
Characterization of photonic modulators
LEBO Science EZ4 Spin Coater is a high performance compact spin coater. It is designed for high uniformity thin material coatings. With its small footprint, the spin coater can be installed in a fume hood or a glove box. The upgraded program can store up to five recipes and each recipe could be edited with five spin steps.
Features
• 5 spin programs with 5 steps for each
• Substrate sizes: from 1cm up to 4″ wafer
Specifications
1. Spin speed range: 100 – 9999 RPM
2. Spin speed resolution: 1 RPM
3. Acceleration range: 100 – 9999 RPM/S
4. Maximum step time: 3000s
The MultiTest is a versatile tensile and compression tester controlled by software running on a PC (-i and -xt models) or as a motorised test stand (-dV model).
Available in a range of capacities as both single and twin-column from 0.5 kN right up to 50 kN, it is ideal for product testing applications according to your own test methods.
• The microscope has a depth-of-field that is 20 times greater than conventional optical microscopes.
• It designs the lenses, cameras, and graphic engine in-house, enabling observation with an optimal balance of depth and brightness.
• Easily perform 2D and 3D measurements. Roughness, contamination, grain size, and other measurements can be performed with one tool.
• With a 1 TB hard drive, images are easily saved locally.
• Images can be shared over LAN or a USB drive.
• Reports can be automatically created and shared.
• The Ts2R can be configured with an optional rectangular mechanical stage. This stage provides a long travel stroke, enabling users to observe an entire well plate from end-to-end.
• The high-intensity LED light source enables you to perform a wide variety of observation methods
• offers Epi-fluorescence observation, provides four fluorescence channels, with 8 different wavelengths to choose from.
• The MFCS™ is a pressure based microfluidic flow controller. Either 4 or 8 channels are available with different pressure ranges for microfluidic experiments.
• generates a constant pressure-driven flow rate that allows for reliable and repeatable experiments.
• Pressure/Vacuum range: -1000 mbar to 1000 mbar
• CHEMICAL COMPATIBILITY:
Gas compatibility: Dry, oil-free gas, air, any non-corrosive or non-explosive gas
Liquid compatibility: Aqueous solvent, oil, organic solvent, biological sample
Carbolite Gero tube furnaces provide excellent temperature uniformity and are ideal for heating small samples.
• Max Temperature: 1200℃
• Single heated zone
• Furnace diameter: 125mm
• Heated length: 400mm
• All models available orientated either horizontally or vertically
Current project application:
Annealing of two-dimensional materials-based devices.
• MPI High-Power device characterization systems are designed specifically for high power device measurement and wide variety of applications such as Device Characterization and Modelling, Wafer Level Reliability, Failure Analysis, IC Engineering, and MEMS.
• Max voltage: 500V
• Max current: 40A
• 3 Probe arms
• Air bearing control, fixed by vacuum.
Current project application:
Characterization of two-dimensional materials-based devices.
• Advanced cryo measurement platform that can perform hall and low-temperature measurements in a vacuum environment
• Temperature range: 10K to 400K
• 6 probe arms
• Up to 2.5T vertical superconducting magnet
• Vacuum chamber : ~10-6 Torr
Current project application: Characterization of two-dimensional materials-based devices
• Three SMUs integrated with a customized pulse measurement system capable of generating varied pulse waveforms
• Smallest pulse width of 1ms possible
• Maximum voltage range:±10V
• Maximum pulse number per iteration of up to 400
Current project application:
Characterization of memtransistors and circuits
• Capacitance based measurement system capable of characterising deep trap states in semiconductors
• I-V, C-V measurement capabilities
• Transient measurements for capacitance that includes temperature scan, frequency scan and depth profiling
Current project application: Deep trap characterization in semiconductor devices
The sputtering system is designed for highly uniform metal oxide thin film deposition for fabrication of nano electronic devices. It is installed in cleanroom.
System specifications:
1. Physical vapour deposition using magnetrons technology
2. Uniform deposition on 6-inch substrate
3. 3 targets can be loaded together
4. Variable-angle deposition
5. High temperature deposition and/or post-deposition annealing upto 800 °C,
6. Post-deposition plasma treatment
7. Available process gases are: Ar, O2, N2
We perform our clean-room process and fabrication at shared facilities located at E6Nanofab and the Center for Advanced 2D Materials (CA2DM) of the National University of Singapore.